科毅科技股份有限公司
IoN 100 Plasma System

IoN 100 Plasma System

IoN 100 是一種筒式等離子體反應器，專為研發和生產應用而設計。該技術基於 International Plasma Corporation、Branson ICP、Dionex、Gasonics、Metroline、TePla 和 PVA TePla 在 50 多年的時間裡開發的經過驗證的反應器設計。IoN 100 使用更大的機箱，提供所有氣體和電源連接。

功能包括：

  • 即插即用自安裝
  • 柔性電極
  • 帶液晶觸摸屏和鍵盤的工業計算機。
  • 基於 Windows 的操作系統。
  • 圖形用戶界面 (GUI) 軟件符合
  • CFR Title 21 Part 11 和 Semi E95-1101
  • 多級用戶訪問
  • 軟件
    • 用於快速和多功能步驟控制的配方編輯器
    • 板載診斷功能和報警記錄
    • 通過以太網進行遠程過程監控
    • 基於網絡的在線模擬/培訓/支持
  • 機箱上的泵電源插座
  • 節能功能—泵控制

典型應用：

  • 表面清潔
  • 表面活化
  • 表面功能化
  • 矽氧烷和有機薄膜的沉積

PROCESS CHAMBER

  • Material: Aluminum
  • Dimension: 375 mm W x 762 mm D x 375 mm H
  • (14.75”x30”x14.75”)
  • Volume: 107 L (3.78 ft3)
  • Electrodes: 5 Shelf
  • Number of MFCs: 1
  • Process Pressure: (0.16 to 2.66) mbar
  • (120 to 2000) mTorr
  • Base Pressure: 0.07 mbar (50 mTorr)
  • Pumping Time: 1 min (Pump dependent)
  • Loading: Manual

PLASMA GENERATOR

  • Frequency/power: 13.56 MHz/600 W

SAFETY CERTIFICATION STANDARDS

  • CE certified
  • EN 60204
  • EN 61326

OPTIONS

  • Automated robotic loading/unloading
  • Stainless steel chamber
  • Electrodes:
    • Self electrode 3/7
    • Multishelf with 3/5/7/9/11 or 13 shelve
    • Vertical or ceiling
    • Power cage
  • Secondary plasma
    • Faraday/Etch cage
  • Plasma generators
    • 13.56 MHz/1000 W
    • (20 to100) kHz/600 W or 1000 W
  • Additional MFCs/up to additional five gasses
  • Corrosive gas MFCs
  • Liquid monomer delivery kits
    • High/Low vapor pressure monomers
  • Process pressure control
  • Light tower with R/Y/G/Buzzer
  • Vacuum pumps (Rotary vane, dry)
  • Onboard gas generators (H2, N2, O2)
  • Wall mounting package
  • SECS/GEM interface

CHASSIS

  • Larger roll around chassis with leveling feet
  • Self contained footprint featuring all gas and all power connections.

MACHINE DIMENSION AND WEIGHT

  • 737 mm W x 1067 mm D x 1981mm H (29”x42”x78”)
  • 350 kg (702 lb) (Varies with options)
  • Performance Data
  • Uptime: 95%
  • MTBF: >500 h
  • MTTR: <2 h

FACILITIES REQUIREMENTS

  • Electricity: (208/240) VAC, 3f, 50/60 Hz, 5-wire,12.8 kW
  • Process Gas Input Pressure: 2 bar (30 psi)
  • Purge Gas Input Pressure: 2 bar (30 psi)
  • Compressed Air Input Pressure: 6 bar (88 psi)

Technical Data

PROCESS CHAMBER

  • Material: Aluminum
  • Dimension: 375 mm W x 762 mm D x 375 mm H
  • (14.75”x30”x14.75”)
  • Volume: 107 L (3.78 ft3)
  • Electrodes: 5 Shelf
  • Number of MFCs: 1
  • Process Pressure: (0.16 to 2.66) mbar
  • (120 to 2000) mTorr
  • Base Pressure: 0.07 mbar (50 mTorr)
  • Pumping Time: 1 min (Pump dependent)
  • Loading: Manual

PLASMA GENERATOR

  • Frequency/power: 13.56 MHz/600 W

SAFETY CERTIFICATION STANDARDS

  • CE certified
  • EN 60204
  • EN 61326

Technical Data

OPTIONS

  • Automated robotic loading/unloading
  • Stainless steel chamber
  • Electrodes:
    • Self electrode 3/7
    • Multishelf with 3/5/7/9/11 or 13 shelve
    • Vertical or ceiling
    • Power cage
  • Secondary plasma
    • Faraday/Etch cage
  • Plasma generators
    • 13.56 MHz/1000 W
    • (20 to100) kHz/600 W or 1000 W
  • Additional MFCs/up to additional five gasses
  • Corrosive gas MFCs
  • Liquid monomer delivery kits
    • High/Low vapor pressure monomers
  • Process pressure control
  • Light tower with R/Y/G/Buzzer
  • Vacuum pumps (Rotary vane, dry)
  • Onboard gas generators (H2, N2, O2)
  • Wall mounting package
  • SECS/GEM interface

Technical Data

CHASSIS

  • Larger roll around chassis with leveling feet
  • Self contained footprint featuring all gas and all power connections.

MACHINE DIMENSION AND WEIGHT

  • 737 mm W x 1067 mm D x 1981mm H (29”x42”x78”)
  • 350 kg (702 lb) (Varies with options)
  • Performance Data
  • Uptime: 95%
  • MTBF: >500 h
  • MTTR: <2 h

FACILITIES REQUIREMENTS

  • Electricity: (208/240) VAC, 3f, 50/60 Hz, 5-wire,12.8 kW
  • Process Gas Input Pressure: 2 bar (30 psi)
  • Purge Gas Input Pressure: 2 bar (30 psi)
  • Compressed Air Input Pressure: 6 bar (88 psi)