Wafer Spin Wash Machine

Product Number：SWT

Wafer Spin Wash Machine (Manual – Desktop Type)

W 400mm x D 450mm x H 420mm

Equipment Summary：

for size 2 "-6" Wafer Substrates

Specifications:

• Exterior Material: PP more resistant to Isopropyl alcohol, Acetone solvent materials
• Sucker: 1 set
• Nozzle: 3 (isopropanol X1, Acetone X 1, Air Nozzle X1).
• Exhaust system
• Discharge waste liquid system
• Motor: AC Servo Motor (speed: 10-6000 RPM)
• Fixed Nozzle: 1 (N2)
• Opening: Manually
• Nozzle head using plastic material, resistant to ACE
• Outfall filter design
• Set low water pressure tank sensor can automatically add liquid
• Nozzle design safety device and avoid adjustment
• Set the lid safety device will stop production